Contacting individual Fe(110) dots in a single electron-beam lithography step

Contacting individual Fe(110) dots in a single electron-beam lithography step.

We report on a new approach, entirely based on an electron-beam lithography technique, to contact electrically, in a four-probe scheme, single nanostructures obtained by self-assembly. In our procedure, nanostructures of interest are located and contacted in the same fabrication step. This technique has been developed to study the field-induced reversal of an internal component of an asymmetric...

Dopant Driven Electron Beam Lithography

Introduction to Electron Beam Lithography

Electron Beam Lithography is a specialized technique for creating extremely fine patterns (~ 50 nm). Derived from the early scanning electron microscopes, the technique in brief consists of scanning a beam of electrons across a surface covered with a resist film sensitive to those electrons, thus depositing energy in the desired pattern in the resist film. The main attributes of the technology ...

A simple electron-beam lithography system.

A large number of applications of electron-beam lithography (EBL) systems in nanotechnology have been demonstrated in recent years. In this paper we present a simple and general-purpose EBL system constructed by insertion of an electrostatic deflector plate system at the electron-beam exit of the column of a scanning electron microscope (SEM). The system can easily be mounted on most standard S...

Electron Beam Lithography for Applications in Nanotechnology

Nanotechnology, apart from being a catch phrase for media and funding, has a serious role for the development of future products in the field of information technology. Specifically, future generations of memory and logic chips depend strongly on the ability of nanolithography. In addition to the promising field of nanoelectronics, optoelectronics as well as photonic devices benefit from the po...